Facilities

  • Surface Photovoltage Spectroscopy (SPV)

 

A photograph of surface photovoltage spectroscope (left) and  the modulated surface photovoltage spectra of the CH3NH3PbI3 perovskite measured at different heating temperatures (right). see example at Appl. Phys. Lett. 103, 183906 (2013).


  • Ion Layer Gas Reaction (ILGAR)

Ultrasonic spray deposition, indeed is an aerosol process offering inherent advantages over the conventional approaches and has been used widely for preparing films of a variety of materials. The precursor aerosols were generated by an ultrasonic mist generator and flowed toward a reaction zone with nitrogen (N2) carrier gas.

A schematic drawing of an apparatus of spray nebulous chemical deposition. see example, Solar Energy, 136 (2016) 515-524.

  • Inductively Coupled Plasma (ICP) System

Properties of surface can be modified or tuned by using a plasma process. Herein, we used inductively coupled plasma (ICP) assisted surface modification to alter or increase the water repellency of sample of interest.

A photograph of the ICP plasma system

SEM micrographs of silk fabrics

(scale bar: 5 μm)

 

  • Resistive Thermal Evaporator

Resistive evaporation is a physical vapor deposition technique.  When heated, the vaporized metal molecules travel from the source to the substrate where they could nucleate, clustering, migrating, and forming a layer of thin-film. Materials that can be deposited using this technique include aluminum (Al), silver (Ag), nickel (Ni) and gold (Au) etc.

  

A photograph of a home-built resistive thermal evaporation system (left), and thermal evaporated Ag electrode with an interdigitated pattern (right).